JWT developed new etching solution which is based on NH4HF2 to make up for the weak points of current HF solution. The characteristics of new developed GLET solution are as below..
 
    GLET solution can not strongly penetrate glass surface and secure more wider etching area because the size of molecule NH4HF2 which is main element of GLET is 27 times’ bigger than HF, thus it is possible to keep the same roughness with the condition of before and after and makes relatively lower pit.
 
 

- When using GLET solution, it is possible to control consecutively changing density of solution by F-Ion density control in the processing of etching. Namely it is possible to keep the condition of chemical virgin ?all the time by supplying main raw materials with tank consecutively after having feedback about the changing amount of F-Ion density and E/R control to a certain level is also possible.